| 摘要 |
A wafer cleaning apparatus and method are provided to prevent a wafer from being exposed to chemicals by connecting an auxiliary tank for storing deionized water to a shower nozzle in case of an abnormal supply state of the deionized water using a valve. An auxiliary tank(100) filled with deionized water is installed along a first line(110), wherein the first line is branched from a deionized water supply unit. The auxiliary tank is connected to a shower nozzle through a second line(120). A valve(122) is installed on the second line to control opening/closing states of the second line. A three-way valve is further installed at a cross portion between the deionized water supply unit and the first line.
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