METHOD AND APPARATUS FOR PREVENTING EDGE DEPOSITION

摘要

A method and apparatus for preventing an edge deposition are provided to preventing securely the edge deposition and to enhance the efficiency of a cleaning process by using a removable purge ring and a purge gas distributing channel with a restriction gap. An apparatus includes a substrate support body(13) with a purge gas transfer channel, a removable purge ring, and a purge gas distributing channel. The removable purge ring(15) is connected to the substrate support body. The purge gas distributing channel is interposed between the substrate support body and the removable purge ring. The purge gas distributing channel has a restriction gap. The restriction gap is used for restricting the volume of purge gas flowing from the purge gas transfer channel through the purge gas distributing channel to an edge portion of a substrate.