| 摘要 |
A wafer guide agitation apparatus in a wet bath for wet cleaning equipment is provided to effectively remove residues by forming 3-dimensional flow of a chemical solution by rotating a wafer guide. A bath(30) of a cleaning equipment is filled with a chemical solution therein, and a semiconductor wafer is transferred into the bath by a robot and is loaded on a wafer guide(10). A supply line(31) for supplying the chemical solution and a heater(32) heating the chemical solution are installed on a bottom portion of the bath. The wafer guide is positioned in the bath to support the wafer in the bath. The wafer guide is rotated in one direction by a driving member(40) in the bath.
|
