DEVELOPER DEVICE AND MOTHOD

摘要

A development device and a developing method of the same are provided to inject uniformly a developer and to improve development uniformity by moving horizontally a nozzle in a scanning manner. A development device is used for removing photoresist by injecting a developer onto a semiconductor wafer. The development device includes a nozzle(100) having a slit nozzle hole(110). The slit nozzle hole has the same diameter as a diameter of a wafer. A nozzle groove(112) is formed in a longitudinal direction of an inside of the slit nozzle hole in order to adjust injection pressure by storing partially a developer. A vent hole(102) is formed at an upper part of the nozzle in order to discharge air bubbles generated from the developer.