| 摘要 |
An injector shield of a CVD apparatus is provided to prevent the damage of wafer due to byproducts and powder after processing by removing smoothly the byproducts and powder using a bracket type portion of a shield part. An injector shield of a CVD apparatus includes a shield part and a vent part. The shield part(30) is performed with an embossing treatment to minimize the generation of byproducts and powder. The vent part(40) is formed like a reverse triangle type structure to perform smoothly a venting process and to prevent the damage of the next wafer(50'). An upper portion of the shield part is formed like a bracket type structure.
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