| 摘要 |
A disc assembly for a high current apparatus is provided to prevent the damage of a wafer by eliminating particles moved to the disc through plural filters installed on the disc. When a high current apparatus is driven by high energy of 100 kev or more, ion beam is generated from a source, and is accelerated while passing a beam line. The beam collides against quartz to move particles to a disc(20) located in an end station. Plural filters(50) are installed on the disc to filter the particles. The disc is rotated at revolutions of 1200 rpm to put the particles out of each filter.
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