| 摘要 |
A rectification apparatus for a wet station is provided to push dropped particles away out from a chemical bath by spraying air from a top to a bottom at an inclined angle to the chemical bath. A robot member(200) is positioned in front of the chemical bath. The robot member transfers wafers into the chemical bath(100),, or loads or unloads the wafer to or from a necessary process. An air curtain(300) is interposed between the chemical bath and the robot member. A blow hole(320) of a cross flow fan(310) is installed at the angle of 10 to 30 deg.C to the robot member.
|
