发明名称 |
SOURCE CANISTER TEMP CONTROL UNIT AND THIN FILM DEPOSITION APPARATUS USING THE SAME |
摘要 |
A unit for adjusting a temperature of a source canister and a thin film deposition apparatus using the same are provided to maintain a state of a source supplied to a chamber, thereby enhancing a process yield of the apparatus. A source canister(110) for storing a source used in a deposition process is enclosed by a water bath tubing(120) for circulating water bath. A sensor(130) is installed in the water bath tubing to detect a temperature of the water bath. A thermal module(10) is disposed closely adjacent to the water bath tubing to absorb or radiate the heat from the water bath. A controller(140) is connected to the sensor and the thermo module to control operation of the thermo module.
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申请公布号 |
KR20070069646(A) |
申请公布日期 |
2007.07.03 |
申请号 |
KR20050131995 |
申请日期 |
2005.12.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KWAK, SE KEUN |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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