发明名称 SOURCE CANISTER TEMP CONTROL UNIT AND THIN FILM DEPOSITION APPARATUS USING THE SAME
摘要 A unit for adjusting a temperature of a source canister and a thin film deposition apparatus using the same are provided to maintain a state of a source supplied to a chamber, thereby enhancing a process yield of the apparatus. A source canister(110) for storing a source used in a deposition process is enclosed by a water bath tubing(120) for circulating water bath. A sensor(130) is installed in the water bath tubing to detect a temperature of the water bath. A thermal module(10) is disposed closely adjacent to the water bath tubing to absorb or radiate the heat from the water bath. A controller(140) is connected to the sensor and the thermo module to control operation of the thermo module.
申请公布号 KR20070069646(A) 申请公布日期 2007.07.03
申请号 KR20050131995 申请日期 2005.12.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KWAK, SE KEUN
分类号 H01L21/205 主分类号 H01L21/205
代理机构 代理人
主权项
地址