发明名称 INSULATION LAYER, ORGANIC THIN FILM TRANSISTOR USING THE SAME AND MANUFACTURING METHOD
摘要 <p>An insulation layer, an organic thin film transistor having the same and a forming method thereof are provided to make a thin film at a low temperature by adding inorganic material into vinyl polymer. A gate electrode(110) is formed in one region on a substrate(100), and a gate insulation layer(120) is formed on the gate electrode and the substrate. An organic semiconductor layer(130) is located at a position corresponding to the organic semiconductor layer on the region of the gate insulation layer. At least a part of source/drain electrodes(140,140') is formed on the organic semiconductor layer. The gate insulation layer contains vinyl polymer and inorganic material.</p>
申请公布号 KR100737383(B1) 申请公布日期 2007.07.03
申请号 KR20060087258 申请日期 2006.09.11
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 KIM, GI HEON;YOON, SUNG MIN;BAEK, KYU HA;YOU, IN KYU;KANG, SEUNG YOUL;AHN, SEONG DEOK;SUH, KYUNG SOO
分类号 H01L29/786;H01L21/31 主分类号 H01L29/786
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