METHOD FOR MANUFACTURING PROBE STRUCTURE

摘要

A method for manufacturing a probe structure is provided to perform easily a wet etching process and to reduce processing costs by forming the probe structure using two semiconductor substrates with different crystalline orientations. A first semiconductor substrate(100) with a first crystalline orientation is bonded to a second semiconductor substrate(110) with a second crystalline orientation. A probe tip region is formed by etching selectively the first and second semiconductor substrates. A probe beam region is formed by etching the second semiconductor substrate. A probe structure(180) composed of the probe tip and the probe beam is formed on the resultant structure by filling the probe tip region and the probe beam region.