EXHAUST SYSTEM OF A SPIN COATER

摘要

An exhaust system of a spin coater is provided to enhance a yield of wafers and to increase productivity by preventing wafer defects due to photoresist fume. An exhaust system of a spin coater includes an exhaust line(20) to absorb photoresist fume generated from a spin coater(10) and to discharge the absorbed photoresist fume to the outside. The exhaust system further includes a vacuum line(40) to remove the photoresist fume by absorbing strongly the accumulated photoresist fume from an inner part of the spin coater and an inner part of a front end of the corresponding exhaust line. The vacuum line is connected to a front end of the vacuum line or the spin coater.