| 摘要 |
A light calibrating key in a phase shift mask is provided to reduce an inspecting time by performing simultaneously pattern and defect inspections using a first and a second pattern portions. A light calibrating key in a phase shift mask includes a first pattern portion and a second pattern portion. The first pattern portion(54) includes a first boundary between a glass substrate(50) and a phase shift layer(52). The first pattern portion is capable of performing a light calibrating process in a pattern inspection. The second pattern portion(56) is formed at a portion adjacent to the first pattern portion. The second pattern portion includes a second boundary between a chrome layer and the glass substrate. The second pattern portion is capable of performing the light calibrating process in a defect inspection.
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