| 摘要 |
A method for manufacturing a blank photomask substrate is provided to enhance the flatness of the photomask substrate by performing firstly a mechanical polishing process on the photomask substrate using slurry and performing secondly a micro polishing process on the photomask substrate using fluorine plasma. A mechanical polishing process is firstly performed on a photomask substrate by using a predetermined slurry(30). A micro polishing process is secondly performed on the photomask substrate by using a predetermined plasma(35). A mask layer is formed on the photomask substrate. Fluorine plasma used as the predetermined plasma.
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