| 摘要 |
A photomask without a pellicle and a manufacturing method thereof are provided to remove an auxiliary photomask preparing process due to the lifetime and cleaning cycle of the pellicle and to economize cleaning costs for the maintenance of the photomask itself by using a mask substrate portion around a light shielding region as the pellicle. A photomask includes a mask substrate(30) and light shielding regions. The light shielding regions(38) are periodically formed in the mask substrate. A mask substrate portion around the light shielding region is used as a pellicle. The light shielding region is formed in the mask substrate by using an ion implantation. The ion implantation is performed by using one selected from a group consisting of alkali metal, alkaline-earth metal, or halogen ion.
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