| 摘要 |
A deposition system is provided to improve the accuracy and yield of deposition process by accurately measuring and controlling concentration and composition of respective deposition materials. A deposition system comprises: a plurality of deposition sources which has a housing part for housing a deposition material and a heating unit for heating the deposition material, and exhausts a material vapor generated by the heating unit to a substrate to form a deposition material layer on a surface of the substrate; a plurality of sensor parts formed in close proximity to the plurality of deposition sources to check concentrations of respective material vapors exhausted from the plurality of deposition sources; and an isolation part(54) which isolates from the circumference a deposition unit part(50) comprising any one deposition source(52) in the plurality of deposition sources and one sensor part in the plurality of sensor parts corresponding to the one deposition source, and has an opened part(58) for exposing the one deposition source according to specific conditions.
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