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发明名称
Semiconductor device with vertical channel improved contact resistance and method of manufacturing the same
摘要
申请公布号
KR100734266(B1)
申请公布日期
2007.07.02
申请号
KR20050064182
申请日期
2005.07.15
申请人
发明人
分类号
H01L29/78;H01L21/336
主分类号
H01L29/78
代理机构
代理人
主权项
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