| 摘要 |
A method and apparatus for manufacturing a ceramic film is provided to grow a thin film at a low temperature by introducing a gas including steam and oxygen gas into an oxidizing gas production portion. A material layer is formed on a base, and a gas including steam and oxygen gas is introduced into an oxidizing gas production portion. The gas in the oxidizing gas production portion is heated, and the heated gas is supplied to an oxidizing furnace(20) to oxidize the material layer. In the step of forming the material layer, a solution including a raw material solution of the ceramic film is applied onto the base or a layer disposed above the base, and then a heat treatment is performed on the applied solution.
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