| 摘要 |
A spin chuck is provided to prevent chemical from flowing on a bottom center portion of the mask by connecting a vacuum line with an edge of a base, thereby preventing the chemical from being flowed on the bottom center of the mask. A mask is seated on a base(110), and a rotary shaft(140) is connected to a center portion of the base to rotate the base. Guide member(120) are located on edges of the base to guide a position of the mask. A vacuum line(130) is connected to the edge of the base to applying vacuum for sucking the mask to the base. A first base part(150) is installed on the surface of the base, and a second base part(160) is installed on the edge of the base and connected to the vacuum line.
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