PROCESS OF FABRICATING THIN FILM PATTERN

摘要

A method for manufacturing a thin film pattern is provided to prevent generation of pin holes by disposing an intermediate material layer used as an etching barrier between a target thin film and a mask layer to prevent etching of the target thin film of a lower portion. A first thin film(12) to be patterned is formed on a substrate(10). A second thin film(14) is formed on the first thin film. The second thin film is made of a material whose etching selectivity is different from the first thin film. A mask layer(16) defining a shape of a pattern is printed on the second thin film. The second thin film exposed through the mask layer is removed by using a first etching solution. The mask layer and the first thin film exposed by the mask layer are removed by using a second etching solution whose etching selectivity is different from the first etching solution.