THE PLASMA SOURCE WITH STRUCTURE OF MULTI-ELECTRODE FROM ONE SIDE TO THE OTHER

摘要

A plane parallel type plasma source having a transverse multi-electrode structure is provided to uniformly distribute high density plasma by using a plasma source assembly comprised of a plurality of modules. An RF(Radio Frequency) power source(10) operates at a high frequency of 100 KHz to 990 MHz. An impedance matching unit(20) is installed to match an impedance between the RF power source and a plasma source supply power source. A plasma source assembly(30) is comprised of a plurality of electrodes(31) and grounds(32) and a gas supply line(33a). The electrodes and the grounds are formed in parallel to a transverse direction in a plasma source outer case(34). An interlayer dielectric is disposed between the electrode and the ground. The gas supply line supplies gas. A vacuum container(40) is formed at a lower section of the plasma source assembly to generate plasma including the gas supplied through the gas supply line. A lower container(50) is a heater or an electrostatic chuck to receive a wafer and an LCD(Liquid Crystal Display). A vacuum pump(60) is coupled to one side of the lower container to form vacuum in the vacuum container. The plasma source assembly is corresponded to a size of the wafer by controlling the number of the electrodes, the grounds, and insulating units.