发明名称 |
THIOL COMPOUND, AND PHOTOSENSITIVE COMPOSITION AND BLACK MATRIX RESIST COMPOSITION USING THE COMPOUND |
摘要 |
The invention is related to a thiol compound represented by formula (1), production method thereof, and a photosensitive composition and a resist composition for black matrix for color filters which use the thiol compound and are excellent in sensitivity and can keep the line width in patterns unchanged, i. e. attain an excellent developing latitude. (All the symbols have the same meanings as defined in the Description.) |
申请公布号 |
KR20070068356(A) |
申请公布日期 |
2007.06.29 |
申请号 |
KR20077007542 |
申请日期 |
2005.10.25 |
申请人 |
SHOWA DENKO KABUSHIKI KAISHA |
发明人 |
KAMATA HIROTOSHI;ONISHI MINA;MUROFUSHI KATSUMI |
分类号 |
C07C323/52;G03F7/00;G03F7/027 |
主分类号 |
C07C323/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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