| 摘要 |
<p>An exposure apparatus by which damages due to leaked out liquid is prevented from expanding and exposure accuracy and measuring accuracy can be maintained. The exposure apparatus is provided with first and second stages (ST1, ST2) which can independently move within an XY flat plane on an image plane side of a projection optical system (PL); a drive mechanism (SD) which moves the first stage and the second stage together in a status where the stages are brought close to each other or brought into contact with each other; an immersion mechanism (1) which forms a liquid immersion area on an upper plane of at least one of the stages of the first stage and the second stage; and a detecting device (60) which detects liquid leaked out from between the first stage and the second stage.</p> |
