发明名称 ELECTRODE APPARATUS HAVING STRING ELECTRODE STRUCTURE IN THE PLASMA PROCESSING APPARATUS
摘要 An electrode apparatus having a string electrode structure of a plasma processing apparatus is provided to uniformly generate plasma discharge by including a string electrode structure for supplying a flowrate of a uniform pressure. Upper and lower electrodes are installed in a plasma processing apparatus. Power is connected to the upper electrode, and the lower electrode(120) is connected to ground. The upper electrode includes a first electrode(122), a plurality of second electrodes(123) and process gas transferring holes(125). The first electrode is disposed at one side of the upper surface of a ceramic substrate(121) into which process gas is introduced. The plurality of second electrodes are disposed in parallel with each other while one end of the second electrode comes in contact with the first electrode. The process gas transferring holes are formed between the second electrodes wherein the process gas flows through the process gas transferring holes. The process gas transferring holes can be installed at regular intervals between the second electrodes, made of a long shape.
申请公布号 KR20070067970(A) 申请公布日期 2007.06.29
申请号 KR20050129547 申请日期 2005.12.26
申请人 ADP ENGINEERING CO., LTD. 发明人 LEE, YOUNG JONG;CHOI, JUN YOUNG;HWANG, IN UK;KIM, HOON
分类号 H01L21/3065 主分类号 H01L21/3065
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