COMPOSITION FOR FORMING LOW DIELECTRIC CONSTANT INSULATING FILM, METHOD OF FORMING INSULATING FILM USING THE COMPOSITION AND ELECTRONIC PARTS HAVING THE INSULATING FILM PRODUCED THEREBY,申请号KR20020041221-传众专利搜索

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发明名称	COMPOSITION FOR FORMING LOW DIELECTRIC CONSTANT INSULATING FILM, METHOD OF FORMING INSULATING FILM USING THE COMPOSITION AND ELECTRONIC PARTS HAVING THE INSULATING FILM PRODUCED THEREBY
摘要
申请公布号	KR100733528(B1)	申请公布日期	2007.06.29
申请号	KR20020041221	申请日期	2002.07.15
申请人		发明人
分类号	H01L21/31;H01L21/768;H01B3/30;H01B3/46;H01L21/312;H01L23/522;H05K1/00	主分类号	H01L21/31
代理机构		代理人
主权项
地址

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