Organosiloxane based composition, useful as silica film precursor, comprises a hydro organosiloxane containing a silyl chain and a stabilizer containing a nitrone group

摘要

#CMT# #/CMT# Organosiloxane based composition, useful as silica film precursor, comprises a hydro organosiloxane (I) containing a silyl chain and a stabilizer (II) containing a nitrone group. #CMT# : #/CMT# Organosiloxane based composition, useful as silica film precursor, comprises a hydro organosiloxane (I) containing a silyl chain of formula (-HSiR-O-) and a stabilizer (II) containing a nitrone group of formula (=N+>(O->)-). R : 1-18C alkyl (alkyl substituted) or alkoxy. An independent claim is included for a silica (SiO2) layer made using the composition. #CMT#USE : #/CMT# The organosiloxane based composition is useful as silica film precursor. The stabilizer (II) is useful stabilize the hydro organo siloxane (I) (all claimed). The composition is useful in the preparation of silica layer having less dielectric constant. The composition in useful in the preparation of integrated circuits. #CMT#ADVANTAGE : #/CMT# The composition enables the introduction of least amount i.e. less than the contaminant level, of impurities into the products e.g. integrated circuits. #CMT#ORGANIC CHEMISTRY : #/CMT# Preferred Components: (I) is 1,3,5,7-tetramethyl cyclotetrasiloxane. (II) is N-tert-butylalpha-phenylnitrone, 5,5-dimethyl-1-pyrroline-N-oxide, alpha-(4-pyridyl-1-oxide)-N-tert-butylnitrone. #CMT#EXAMPLE : #/CMT# No suitable example given.