| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photoresist composition which ensures good uniformity of coating even in a large area and excels in resist pattern profile. <P>SOLUTION: The positive photoresist composition comprises an alkali-soluble resin, a 1,2-quinonediazido compound and an organic solvent and is obtained by blending a fluorine-containing organosilicon compound represented by formula (1) as a surfactant, wherein Rf is a 5-30C perfluoroalkyl group containing one or more ether bonds in a molecular chain; Q is a polyether group comprising a homopolymerized chain of polyethylene glycol or polypropylene glycol or a copolymerized chain thereof; R is hydrogen atom or a 1-4C alkyl group; X is a divalent linking group other than oxygen atom; Y is a divalent linking group; p is an integer of ≥3; and n is a positive number of 0<n<3. <P>COPYRIGHT: (C)2007,JPO&INPIT |
