| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent the dust from depositing on a reticle to elevate a productivity while holding or transferring the reticle in an exposing apparatus. <P>SOLUTION: The exposing apparatus is constructed in a manner such that a reticle holding container 27 is transferred between a chamber 3 with which a vacuum means 29, 30 are connected and the outside of the apparatus through a load lock chamber 24. An opening/closing means 13 to close the reticle holding container is located in the chamber 3, and a reticle holding portion 12 to hold the reticle holding container is provided in the chamber. <P>COPYRIGHT: (C)2007,JPO&INPIT |
