| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an improved device or method for characterizing lithographic processing and/or a lithographic processing system. <P>SOLUTION: The lithographic process of a device (152) is characterized by focus conditions, a set of selectable lithographic processing system parameter values and selectable reticle parameter values. The method for characterizing comprises receiving values for the lithographic processing system parameters and for the reticle parameters (210, 220), and receiving focus conditions for the lithographic processing characterized by the selected values, the focus conditions allowing separation of image performance effects due to lithographic processing system aberrations and image performance effects due to reticle shadowing effects (230). The method furthermore comprises determining image performance effects due to lithographic processing system aberrations and image performance effects due to reticle shadowing effects (240). <P>COPYRIGHT: (C)2007,JPO&INPIT |
