发明名称 CLUSTER DEPOSITION APPARATUS AND DEPOSITION METHOD, AND CLUSTER GENERATION APPARATUS AND GENERATION METHOD
摘要 PROBLEM TO BE SOLVED: To increase the amount of generation of cluster groups and an increase of taking of the cluster groups out of a cluster generation container by enhancing the intensity of a laser beam. SOLUTION: The apparatus of depositing a cluster film 10 by irradiating a target 1 with the laser beam 2 to cause the generated material vapor to generate impact waves 4 of an inert gas so that the impact waves 4 confine the material vapor reflected on the wall of the cluster generation container 5 and come to progress in a specific region to generate the cluster groups by the impact of the atoms or molecules of the material vapor against each other, and to make the cluster groups flow out of an outflow window 7, thereby spraying the cluster groups on a substrate 9 and depositing the cluster film 10. The cluster generation container is enlarged so as to fulfill the conditions to enlarge the sectional area of the laser beam 2 on the target surface according to the enhancement of the energy intensity of the laser beam 2, to make the increase of the generated amount of the vapor of the material vapor and the efficient generation of the impact waves of the inert gas compatible with each other and to close the material steam with reflective wave of the impact waves at the same time. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007162059(A) 申请公布日期 2007.06.28
申请号 JP20050358927 申请日期 2005.12.13
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;JAPAN INDUSTRIAL TECHNOLOGY ASSOCIATION 发明人 IWATA YASUTSUGU;TAKITANI TOSHIO
分类号 C23C14/28 主分类号 C23C14/28
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