| 发明名称 |
Method for Manufacturing Semiconductor Device |
| 摘要 |
Disclosed herein is a method for manufacturing a semiconductor device that includes performing an O<SUB>2 </SUB>plasma treatment step after forming a Si-containing anti-reflection film.
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| 申请公布号 |
US2007148602(A1) |
申请公布日期 |
2007.06.28 |
| 申请号 |
US20060468080 |
申请日期 |
2006.08.29 |
| 申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
LEE SUNG KOO;JUNG JAE CHANG |
| 分类号 |
G03F7/26 |
主分类号 |
G03F7/26 |
| 代理机构 |
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代理人 |
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| 主权项 |
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