发明名称 |
Method for cleaning a lithographic apparatus module, cleaning arrangement for a lithographic apparatus module and lithographic apparatus comprising the cleaning arrangement |
摘要 |
A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m<SUP>3 </SUP>in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa).
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申请公布号 |
US2007145296(A1) |
申请公布日期 |
2007.06.28 |
申请号 |
US20050314099 |
申请日期 |
2005.12.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
FRERIKS JOHANNES M.;BANINE VADIM Y.;IVANOV VLADIMIR V. |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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