发明名称 SYSTEM, METHOD AND APPARATUS FOR SELF-CLEANING DRY ETCH
摘要 <p>A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species deposited on the inner surface. A cleaning chemistry is injected into the processing chamber. The cleaning chemistry can be reactive with a second one of the species to convert the second species to the first species. The volatilized first species can also be output from the processing chamber. A system for cleaning the process chamber is also described.</p>
申请公布号 SG132675(A1) 申请公布日期 2007.06.28
申请号 SG20070035090 申请日期 2004.12.30
申请人 LAM RESEARCH CORPORATION 发明人 III ANDREW D. BAILEY;LOHOKARE SHRIKANT P.;HOWALD ARTHUR M.;KIM YUNSANG
分类号 H01J37/32;H01L21/00;H01L21/302;H01L21/3065;H01L21/321;H01L21/3213;H01L21/44;H01L21/461;H01L21/4763;H01L21/768;H01L23/48;H01L23/52;H01L29/24;H01L29/40;H01L33/00 主分类号 H01J37/32
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