| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus of the semiconductor substrate capable of improving an availability factor corresponding to patterning of two or more sorts of photosensitive materials, and patterning efficiently and stably on the semiconductor substrate while being set as a wavelength and illumination suitable for a photosensitive material. <P>SOLUTION: An aligner 20 has a memory 23 wherein a wavelength, illumination, and a light exposure of light defined according to a photosensitive material 18 are stored in the memory. In the aligner 20, illumination of light which switches a filter of a movable filter 21 so as to make only light of a specific wavelength penetrate, and to detect the illuminance of the light made to penetrate by an illuminance sensor 22. The difference between the detected illumination and the illumination read out from the memory part is calculated by an illumination difference operation part 9, and a correction value is calculated based on the difference. A control unit 10 controls the optical power operation of a light source 2 to become the illumination corresponding to a photosensitive material according to a correction value, and controls opening-and-closing operation of a shutter 11 to become a light exposure corresponding to a photosensitive material based on a light exposure read out from the memory. <P>COPYRIGHT: (C)2007,JPO&INPIT |
