发明名称 PHOTOCURABLE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photocurable resin composition that is excellently handleable on optical shaping and gives a three-dimensional shaped product exhibiting excellent mechanical properties, and an optical three-dimensional shaping method. <P>SOLUTION: The photocurable resin composition comprises a urethanated acrylic compound (I) represented by general formula (I), a monofunctional acrylate, other (meth)acrylate compounds and a photoradical polymerization initiator. In the formula, R<SP>1</SP>is H or a methyl group; d is 1 or 2, and, when d is 2, one or both of R<SP>1</SP>'s are a methyl group; A is a diol or triol residue; D is a bivalent or trivalent unsubstituted or substituted hydrocarbon group; G is a group represented by the formula: -(CH<SB>2</SB>CH<SB>2</SB>O)<SB>g</SB>- (wherein g is 1-4), a group represented by the formula: -[CH<SB>2</SB>CH(CH<SB>3</SB>)O]<SB>h</SB>- (wherein h is 1-4), or a group represented by the formula: -(CH<SB>2</SB>CH<SB>2</SB>O)<SB>j</SB>[CH<SB>2</SB>CH(CH<SB>3</SB>)O]<SB>k</SB>- (wherein j and k are each 1-3, and the sum of j and k is 2-4); R<SP>2</SP>is H or an alkyl group; e is 1 or 2; and f is 3 or 4. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007161953(A) 申请公布日期 2007.06.28
申请号 JP20050363244 申请日期 2005.12.16
申请人 CMET INC;SHINNAKAMURA KAGAKU KOGYO KK 发明人 ITO TAKASHI;HAGIWARA TSUNEO;NAKAMURA TAKAYUKI;NAKAMURA SEISAKU
分类号 C08F290/06 主分类号 C08F290/06
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