发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
摘要 A semiconductor device includes a substrate in which at least one transistor is formed; an interlayer insulating layer formed over the entire surface of the substrate including the transistor, the interlayer insulating layer having contact holes to expose the electrodes of the transistor; and contact insulating layers formed over the internal walls of the contact holes.
申请公布号 US2007145491(A1) 申请公布日期 2007.06.28
申请号 US20060616259 申请日期 2006.12.26
申请人 SHIN YOUNG WOOK 发明人 SHIN YOUNG WOOK
分类号 H01L29/76 主分类号 H01L29/76
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