METHOD AND APPARATUS FOR CYLINDRICAL MAGNETRON SPUTTERING USING MULTIPLE ELECTRON DRIFT PATHS

摘要

A cylindrical cathode target assembly for use in sputtering target material onto a substrate comprises a generally cylindrical target (30) , means for rotating the target about its axis during a sputtering operation, a magnetic array (80) carried within the target for generation of a plasma-containing field including a plurality of electron drift paths adjacent an outer surface of the target, and a device for supporting the magnetic array (80) independently of rotation of the target . In certain embodiments of the invention, the magnetic array may include a plurality of magnetic elements (540) arranged to form a plurality of electron drift paths spaced along a substantial length of the target to promote generally uniform film deposition and uniform target utilization along its length.