LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD,申请号SG20060081707-传众专利搜索

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发明名称	LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要	<p>In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.</p>
申请公布号	SG132647(A1)	申请公布日期	2007.06.28
申请号	SG20060081707	申请日期	2006.11.23
申请人	ASML NETHERLANDS B.V.	发明人	JANSEN, HANS;CORNELISSEN, SEBASTIAAN MARIA JOHANNES;DONDERS, SJOERD NICOLAAS LAMBERTUS;DE GRAAF, ROELOF FREDERIK;HOOGENDAM, CHRISTIAAN ALEXANDER;JACOBS, HERNES;LEENDERS, MARTINUS HENDRIKUS ANTONIUS;MERTENS, JEROEN JOHANNES SOPHIA MARIA;STREEFKERK, BOB;VAN DER TOORN, JAN- GERARD CORNELIS;SMITS, PETER;JANSSEN, FRANCISCUS JOHANNES JOSEPH;RIEPEN, MICHEL
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