发明名称 |
VOLTAGE MEASURING METHOD, ELECTRICAL TEST METHOD AND APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND DEVICE SUBSTRATE MANUFACTURING METHOD |
摘要 |
<p>PURPOSE: A method for measuring a voltage is provided to prevent productivity from being decreased by fine dust generated in using a probe in a subsequent process by determining the state of a pixel while not directly using the probe in an interconnection or a probe terminal. CONSTITUTION: The first alternating current(AC) voltage is applied to a gap between two terminals of the first coil. The first and second coils overlap each other, having a uniform interval therebetween. The third AC voltage is applied to a pixel electrode of the pixel by using the second AC voltage generated between two terminals of the second coil. The pixel electrode and a test electrode overlap each other, having a uniform interval therebetween. A voltage applied from the fourth AC voltage generated in the test electrode to the pixel electrode is calculated.</p> |
申请公布号 |
SG132529(A1) |
申请公布日期 |
2007.06.28 |
申请号 |
SG20050071576 |
申请日期 |
2002.05.02 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
HIROKI MASAAKI |
分类号 |
H01L21/66;G01R31/28;G01R31/302;H01L33/00;(IPC1-7):G01R31/315 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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