| 摘要 |
A mask for forming a microlens pattern and a CMOS image sensor manufactured using the mask for forming a microlens pattern is provided. The mask includes a transparent substrate, a plurality of light-blocking layers, and a dummy pattern. The plurality of light-blocking layers are formed on the transparent substrate to define microlens regions of an image sensor, and the dummy pattern is formed between the plurality of light-blocking layers. The dummy pattern can be formed between corners of four adjacent light-blocking layers.
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