| 摘要 |
A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus is provided with an alignment system for aligning the patterning device with the substrate. The patterning device includes a proximity mark with a number of adjacent proximity structures, each proximity structure including a space structure, a reference structure, and a test structure. The reference structure includes a first number of lines at a reference pitch, and the test structure includes a second number of lines at a test pitch. The patterning device may be used to perform proximity matching using the alignment system, or to perform further quality measurements, such as dose-to-size.
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