EQUIPMENT FOR EXPOSING SEMICONDUCTOR DEVICE

摘要

Exposure equipment for manufacturing a semiconductor is provided to prevent local generation of a particle on a reticle and repeated exposure defect due to a foreign substance of the reticle by using a foreign removing unit. A light source(110) generates light for sensitizing a photoresist liquid formed on a wafer(100). A wafer stage(102) supports the wafer where the light generated in the light source is incident. A reticle(160) is formed between the wafer stage and the light source. The reticle transfers a pattern image to the wafer by using the light irradiated from the light source. A reticle stage supports an edge of the reticle. A foreign substance removing unit is formed to be adjacent to the reticle stage and removes a foreign substance caused in the reticle.