Chemical mechanical polishing particles and slurry and method of producing the same

摘要

In a method of producing chemical mechanical polishing particles and slurry, a type of organic nano particles are put in a reaction solution containing nano-scale cerium oxide; the nano-scale cerium oxide is assembled to outer surface of the organic nano particles due to electrostatic attraction among particles, so as to form chemical mechanical polishing particles having a cerium oxide shell. The chemical mechanical polishing particles having a cerium oxide shell are then used to produce chemical mechanical polishing slurry.