发明名称 |
X-RAY MASK AND ITS MANUFACTURING METHOD, AND GRADATION MASK FOR ULTRAVIOLET RAY LITHOGRAPHY |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask which enables molding of three-dimensional shape in microfabrication by an LIGA process and ultraviolet ray lithography, using a simple and convienient method. <P>SOLUTION: A binder resin containing particulate as an X-ray absorber 10 on a supporting body penetrating X ray is pattern-printed and laminated as an ink agent of a particulate paste 17 on a substrate 11 by ink jet method. The lamination thickness is changed to form an X-ray mask 12 with three-dimensional structure wherein the penetration quantity of X ray can be controlled. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007165362(A) |
申请公布日期 |
2007.06.28 |
申请号 |
JP20050355886 |
申请日期 |
2005.12.09 |
申请人 |
FUJI PUREAMU KK;HYOGO PREFECTURE |
发明人 |
UCHIUMI YUICHI;HATTORI TADASHI;MATSUMOTO JITSUZO |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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