发明名称 X-RAY MASK AND ITS MANUFACTURING METHOD, AND GRADATION MASK FOR ULTRAVIOLET RAY LITHOGRAPHY
摘要 <P>PROBLEM TO BE SOLVED: To provide a mask which enables molding of three-dimensional shape in microfabrication by an LIGA process and ultraviolet ray lithography, using a simple and convienient method. <P>SOLUTION: A binder resin containing particulate as an X-ray absorber 10 on a supporting body penetrating X ray is pattern-printed and laminated as an ink agent of a particulate paste 17 on a substrate 11 by ink jet method. The lamination thickness is changed to form an X-ray mask 12 with three-dimensional structure wherein the penetration quantity of X ray can be controlled. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007165362(A) 申请公布日期 2007.06.28
申请号 JP20050355886 申请日期 2005.12.09
申请人 FUJI PUREAMU KK;HYOGO PREFECTURE 发明人 UCHIUMI YUICHI;HATTORI TADASHI;MATSUMOTO JITSUZO
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址