| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment device and a substrate treatment method which enable a peripheral region of a substrate to be cleaned well by a sponge-like substrate cleaning brush. SOLUTION: A sponge-like substrate cleaning brush 10 for cleaning a peripheral region of a substrate W has a peripheral edge face cleaning part 31 in contact with a peripheral edge face 8 of the substrate W and a peripheral part cleaning part 32 in contact with a peripheral part 9 of one surface of the substrate W. The shape of the peripheral edge face cleaning part 31 is held by a first support member 35, and the shape of the peripheral part cleaning part 32 is held by a second support member 36. The substrate cleaning brush 10 is attached to an oscillating arm 11. The oscillating arm 11 is oscillated horizontally by an oscillating driving mechanism 12, and is moved up and down by an elevating driving mechanism 13. The oscillating driving mechanism 12 is controlled to press the substrate cleaning brush 10 to a peripheral edge face 8 of the substrate W, and the elevating driving mechanism 13 is controlled to press the substrate cleaning brush 10 to the peripheral part 9 of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT
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