发明名称 COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SUCH COATING LIQUID
摘要 <p>Disclosed is a coating liquid for forming a low dielectric constant amorphous silica coating film having a relative dielectric constant of not more than 3.0 and a film strength (Young's modulus of elasticity) of not less than 3.0 GPa, while exhibiting excellent hydrophobicity. Specifically disclosed is a coating liquid for forming a low dielectric constant amorphous silica coating film, which comprises (1) a silicon compound obtained by hydrolyzing a bis(trialkoxysilyl)alkane (BTASA) and an alkoxysilane (AS) in the presence of a tetraalkylammonium hydroxide (TAAOH), or (2) a silicon compound obtained by hydrolyzing a bis(trialkoxysilyl)alkane (BTASA), an alkoxysilane (AS) and a tetraalkylorthosilicate (TAOS) in the presence of a tetraalkylammonium hydroxide (TAAOH).</p>
申请公布号 WO2007072750(A1) 申请公布日期 2007.06.28
申请号 WO2006JP325026 申请日期 2006.12.15
申请人 CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.;EGAMI, MIKI;ARAO, HIROKI;NAKASHIMA, AKIRA;KOMATSU, MICHIO 发明人 EGAMI, MIKI;ARAO, HIROKI;NAKASHIMA, AKIRA;KOMATSU, MICHIO
分类号 C09D183/04;C01B33/12;C09D5/25;C09D183/07;C09D183/08;H01L21/312;H01L21/768 主分类号 C09D183/04
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