发明名称 |
COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SUCH COATING LIQUID |
摘要 |
<p>Disclosed is a coating liquid for forming a low dielectric constant amorphous silica coating film having a relative dielectric constant of not more than 3.0 and a film strength (Young's modulus of elasticity) of not less than 3.0 GPa, while exhibiting excellent hydrophobicity. Specifically disclosed is a coating liquid for forming a low dielectric constant amorphous silica coating film, which comprises (1) a silicon compound obtained by hydrolyzing a bis(trialkoxysilyl)alkane (BTASA) and an alkoxysilane (AS) in the presence of a tetraalkylammonium hydroxide (TAAOH), or (2) a silicon compound obtained by hydrolyzing a bis(trialkoxysilyl)alkane (BTASA), an alkoxysilane (AS) and a tetraalkylorthosilicate (TAOS) in the presence of a tetraalkylammonium hydroxide (TAAOH).</p> |
申请公布号 |
WO2007072750(A1) |
申请公布日期 |
2007.06.28 |
申请号 |
WO2006JP325026 |
申请日期 |
2006.12.15 |
申请人 |
CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.;EGAMI, MIKI;ARAO, HIROKI;NAKASHIMA, AKIRA;KOMATSU, MICHIO |
发明人 |
EGAMI, MIKI;ARAO, HIROKI;NAKASHIMA, AKIRA;KOMATSU, MICHIO |
分类号 |
C09D183/04;C01B33/12;C09D5/25;C09D183/07;C09D183/08;H01L21/312;H01L21/768 |
主分类号 |
C09D183/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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