MANUFACTURING METHOD OF MASK

摘要

A method for manufacturing a mask is provided to form a mask data pattern for improved reliability of an SADP(Self-Align Double Patterning) process by using a layout based SADP emulation and an image based SADP emulation. A first mask data pattern is designed(S110). A second mask data pattern is designed in order to embody the first mask data pattern(S120). A first emulation pattern is obtained from the second mask data pattern by using a layout based SADP emulation(S130). The second mask data pattern is modified according to the results of comparison of the first emulation pattern with the first mask data pattern(S150). An OPC(Optical Proximity Correction) is performed on the modified second mask data pattern(S160). A second emulation pattern is obtained from the resultant second mask data pattern by using an image based SADP emulation(S170). A first mask layer corresponding to the second mask data pattern is manufactured according to the results of comparison of the second emulation pattern with the first mask data pattern.