| 摘要 |
In a known method for particle analysis, at least part of a particle accumulation is illuminated on a substantially planar substrate and imaged, a measurement area of the particle accumulation being displaced grid by grid, and imaging data obtained on the measurement area being evaluated with respect to particle characteristics. Starting from this, to provide a method for particle analysis that also in an automatic microscopic analysis of a particle accumulation with metallic particles supplies an exact analysis result in a fast and reproducible manner, it is suggested according to the invention that on each measurement area a first series of imaging data should be generated from an image obtained with light of a first polarization state which masks reflections of metallic particles, and a second series of imaging data should be generated from an image obtained with light of a second polarization state which does not mask reflections of metallic particles, the two series of imaging data being compared and metallic particles being detected in this process and said particles being evaluated with respect to number and size, the first polarization state and the second polarization state being set by adjusting a polarization device by means of an electrical adjusting device.
|
