| 摘要 |
<p>The present invention relates to a system and method for producing ultrapure water, particular for use in immersion lithography processes. In one embodiment of the present invention, a self contained point-of-use cabinet that can consistently provide ultrapure water for use in immersion lithography equipment is provided. The present invention also relates to a system and method for providing a material having a predetermined specific refractive index to an immersion lithography device.</p> |
