发明名称 METHOD OF VERIFICATING OPC
摘要 A method for verifying an OPC(Optically Proximity Correction) is provided to decrease review time and to improve verification accuracy by chopping a bending portion of a corrected original layout to form a patterned shape in advance on a mask. An original layout is designed(S1). The original layout is corrected by using an OPC(S2). A bending portion of the corrected original layout is chopped(S3). A simulation is performed to compare the chopped original layout with a calibrated model(S4). Therefore, review time is decreased and verification accuracy is improved.
申请公布号 KR20070067374(A) 申请公布日期 2007.06.28
申请号 KR20050128603 申请日期 2005.12.23
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM, CHEOL KYUN
分类号 H01L21/027;H01L21/02;H01L21/66 主分类号 H01L21/027
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