发明名称 MICROWAVE ION SOURCE, LINEAR ACCELERATOR SYSTEM, ACCELERATOR SYSTEM, ACCELERATOR SYSTEM FOR MEDICAL USE, HIGH ENERGY BEAM APPLICATION SYSTEM, NEUTRON GENERATING DEVICE, ION BEAM PROCESSING DEVICE, MICROWAVE PLASMA SOURCE, AND PLASMA PROCESSING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a microwave ion source or a plasma source stabilizing beam current without precise magnetic field adjustment by reducing change of plasma density caused by change of strength of magnet field in axial direction or ion beam current, and to provide an application device utilizing the above devices such as a linear accelerator system, an accelerator system for medical use, or the like. <P>SOLUTION: Multipolar magnetic field B2 trapping a plasma generated by discharge is locally generated at neighborhood of a discharging container by arranging 16 pieces of permanent magnets 6 around the discharging container so that the polarity of adjacent magnets are different from each other. A change of plasma density caused by the change of a magnetic field B1 in axial direction due to the multipolar magnetic field is reduced, and a change of ion beam current drawn out from holes of electrodes 9a to 9c is reduced as well. By the above, the ion beam current can be stabilized without precisely adjusting the magnetic field B. Further, an ion beam of large current can be stably obtained even in the case of generating the magnetic field B1 in axial direction by a permanent magnet 15. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007165250(A) 申请公布日期 2007.06.28
申请号 JP20050363586 申请日期 2005.12.16
申请人 HITACHI LTD 发明人 TANAKA MASANOBU;HARA SHIGEMITSU;IGA TAKASHI
分类号 H01J27/18;A61N5/10;H01J37/08;H01J37/30;H01J37/32;H05H1/46;H05H3/06;H05H7/08 主分类号 H01J27/18
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